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Integrated Ferroelectrics
An International Journal
Volume 30, 2000 - Issue 1-4
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Original Articles

Advanced model of metal-organic chemical vapor Deposition of BaxSr1-xTiO3 oxides

V. F. Mymrin Soft-Impact Ltd., P. O. Box 33, 194156, St. Petersburg, Russia
,
S. A. Smirnov Soft-Impact Ltd., P. O. Box 33, 194156, St. Petersburg, Russia
,
A. E. Komissarov Soft-Impact Ltd., P. O. Box 33, 194156, St. Petersburg, Russia
,
S. Yu. Karpov Soft-Impact Ltd., P. O. Box 33, 194156, St. Petersburg, Russia
,
I. N. Przhevalski Russian Research Center for Applied Chemistry, 14 Dobrolubov str, 197198, St. Petersburg, Russia
,
Yu. N. Makarov University of Erlangen-Nurnberg, Fluid Mechanics Institute, 4 Cauerstrasse, 91058, Erlangen, Germany
,
M. Dauelsberg AIXTRON AG, Kackertstr. 15–17, D-52072, Aachen, Germany
,
M. Schumacher AIXTRON AG, Kackertstr. 15–17, D-52072, Aachen, Germany
,
P. Strzyzewski AIXTRON AG, Kackertstr. 15–17, D-52072, Aachen, Germany
,
G. Strauch AIXTRON AG, Kackertstr. 15–17, D-52072, Aachen, Germany
&
H. Juergensen AIXTRON AG, Kackertstr. 15–17, D-52072, Aachen, Germany
 show all
Pages 271-280 | Received 10 Apr 2000, Published online: 19 Aug 2006
 
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Abstract

An advanced model of BaxSr1-xTiO3 Chemical Vapor Deposition is proposed. The model implies that metal-organic precursor decomposition occurs primarily at the reactor surfaces. Deposition of various parasitic solid phases (TiO2, BaO, SrO, etc.) is taken into account. The model predicts deposition rate, solid phase composition and fraction of parasitic phases in the grown film as a function of growth parameters.

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