Electrically tunable Ag(Ta,Nb)O₃ thin film structures on oxide substrates

Abstract

We report on design, fabrication, and comparative test of three different types of voltage-variable interdigital capacitors made on ferroelectric Ag(Ta,Nb)O₃ films deposited on MgO and A1₂O₃ substrates. X-ray diffraction patterns show that ATN films pulsed laser deposited on MgO(001) and Al₂O₃(0112) single crystals have preferential (00/) and (0kk) orientation. Capacitance and loss tangent in interdigital capacitors were measured as the functions of frequency and applied dc voltage bias. Loss tangent was as low as 0.0025 and 0.0034 and AT-factor (tunability/tanδ) was around 26.2 and 20.0 for MgO and A1₂O₃, respectively, @ ± 40 V (maximum electric field 200 kV/cm), 300 K, and 1 MHz. Both of polarization and steady leakage currents were observed in the current-time domain measurements. 0.1 pF interdigital capacitors have pA leakage current level @ ± 40 V.

Key Words:

• Ag(Ta,Nb)O₃ films
• low loss tangent
• MgO
• A1₂O₃
• Tenability
• K-factor.