Publication Cover
Integrated Ferroelectrics
An International Journal
Volume 64, 2004 - Issue 1
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Original Articles

Fabrication and Characterization of Ba(Ti,Zr)O3 Thin Films Through the Chemical Solution Deposition Process

, , , , &
Pages 227-236 | Received 01 Apr 2004, Accepted 01 May 2004, Published online: 11 Aug 2010
 

Abstract

Lead- and bismuth-free Ba(Ti1 − x Zr x )O3 (BTZ) thin films were fabricated on Pt(111)/Ti/SiO2/Si(100) substrates by the chemical solution deposition (CSD) process. The single phase BTZ thin films were obtained at 650°C by conventional process and the control of lattice parameter a was possible by Zr substitution. As the D-E hysteresis loops and J-V characteristics depended on the precipitates on film surface, the fabrication process was reexamined by 2-step sintering process. Consequently the decreasing of first sintering time was able to prevent the precipitates, and the larger grain of about 40–50 nm were obtained by additional sintering for 2 hour.

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