EFFECTS OF ELECTRODEPOSITION CONDITIONS ON THE MICROSTRUCTURES OF ZNO THIN FILMS

SONGTAO JIANG The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China

MENGQIANG WU The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China

YING ZHOU The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China

YUAN WEN The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China

CHENGTAO YANG The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China

SHUREN ZHANG The State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, 4, section 2, North Jianshe Road, Chengdu, 610054, P. R. China

ABSTRACT

ZnO thin films were grown by cathodic deposition on indium tin oxide (ITO)-covered glass substrates from a simple aqueous zinc nitrate solution. Cyclic voltammetry (CV) experiments were performed to verify the reaction mechanism. X-ray diffraction measurements indicated that the as-grown films were of hexagonal wurtzite structure. The influence of the electrodeposition conditions and the post-heating on the microstructures of the polycrystalline ZnO thin films was investigated by SEM and AFM observations. The microstructures of the ZnO thin films could be improved by annealing treatment. The films obtained at 0.1 M Zn(NO₃), −0.9 V potential and 65°C were compact, homogeneous and (002) oriented, and the average deposition rate can be evaluated to be 2 μm/h.

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EFFECTS OF ELECTRODEPOSITION CONDITIONS ON THE MICROSTRUCTURES OF ZNO THIN FILMS

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EFFECTS OF ELECTRODEPOSITION CONDITIONS ON THE MICROSTRUCTURES OF ZNO THIN FILMS

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