Publication Cover
Integrated Ferroelectrics
An International Journal
Volume 104, 2008 - Issue 1
57
Views
1
CrossRef citations to date
0
Altmetric
Original Articles

Q-FACTOR IMPROVEMENT OF FR-4 EMBEDDED RF INDUCTORS BY USING HETERO-DIELECTRIC REFRACTION

, &
Pages 70-79 | Received 03 Oct 2008, Published online: 20 Sep 2010
 

ABSTRACT

In this paper, FR-4 embedded RF spiral inductors with hetero dielectric layers were newly designed, fabricated, and characterized in order to improve their quality factors. BaTiO3 composite high dielectric layer was applied to form the hetero dielectric layers at multi-layered FR-4 packaging substrate to reduce leakage current losses of the embedded inductors and to increase capacitance densities of embedded capacitors. The maximum quality factors of FR-4 embedded RF spiral inductors with high dielectric layer were higher than 60 which were improved by averagely 13% in comparison to those of the inductors without high dielectric layer. These embedded high-Q inductors into FR-4 packaging substrate would be necessary for advanced RF/wireless systems since they have excellent performance characteristics, small size, and light volume.

ACKNOWLEDGMENTS

This research was partially supported by Intelligent RF Engineering Research Center (ERC) of Korea Ministry of Science and Technology and the Seoul Research and Business Development Program (Grant No. 10583). The authors are grateful to MiNDaP group members for their technical supports. Mr. H.S. Lee of DaeDuck Electronics Co. is also acknowledged for his fabrication supports.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.