Abstract
Ni0.5Zn0.5Fe2O4 (NZFO) thin films grown on LaNiO3 (LNO) buffered Si (100) substrates were prepared by chemical solution deposition. The sample annealed rapidly at 600°C in oxygen atmosphere. X-ray diffraction result showed that, the sample annealed in oxygen atmosphere is polycrystalline thin film. Field-emission scanning electron microscopy result revealed that the average grain size of the sample is about 20 nm. The magnetic measurement gave a typical value of the saturation magnetization of 0.767 emu/cm3. The chemical states and chemical composition of the film was also determined by X-ray photoelectron spectroscopy (XPS).
Acknowledgments
This work was supported by the National Natural Science Foundation of China (Grant No. 10774030 and 11032010), and the Guangdong Provincial Natural Science Foundation of China (Grant No. 8151009001000003 and 10151009001000050).