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Integrated Ferroelectrics
An International Journal
Volume 145, 2013 - Issue 1
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Original Articles

Effects of Deposition Pressure on the Microstructure and Hardness of Ti/TiN Nanolayered Coatings

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Pages 32-39 | Received 15 Sep 2012, Accepted 01 Feb 2013, Published online: 12 Jul 2013
 

Abstract

The polycrystalline Ti/TiN multilayer films were deposited by magnetron sputtering. We investigated the effects of mixed discharge gas pressure on the microstructural, interfacial, and mechanical properties of the polycrystalline Ti/TiN multilayer films. X-ray reflectivity and diffraction (XRR and XRD), and nanoindentation were used to characterize the structures and mechanical properties for the films. It was found that the hardness enhancement is caused by the modulus difference in the interface between layer Ti and TiN. The elastic modulus is strongly related to the composition of crystalline orientation and distortion. The sharp interface is good for improving the mechanical properties for Ti/TiN multilayer.

Acknowledgments

This work was supported by the National Natural Science Foundation of China (Grant No. 10974257) and Jilin Provincial National Science Foundation (Grant No. 201115133).

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