Abstract
In this paper, deposition method with spin coating technique in order to improve its dielectric properties. This study was to find out how the effect of mustard chlorophyll exposure on films was analyzed using x-ray diffraction and micro-Raman spectroscopy based on crystal structure and the stability of the film phase BST doping mustard chlorophyll. The annealing process is carried out as a high temperature heating step which aims to restore the physical and crystalline properties of the film which may change during the film growth process. The specified annealing temperature is 850 °C with a holding time of 8 h. The effect of chlorophyll solidification was observed by applying variations of chlorophyll mustard concentration, namely 0%, 2.5%, and 5%. The crystal structure type and film lattice parameters were confirmed using X-Ray Diffraction with the measurement angle starting from an angle of 10° to 80° with an angle increase of 0.02°.
Acknowledgments
We gratefully acknowledge the funding from USAID through the SHERA Center for Development of Sustainable Region (CDSR) program. We also gratefully acknowledge the funding from Penelitian Dasar Unggulan Perguruan Tinggi (PDUPT) program with grant number 129/SP2H/PTNBH/DRPM/2018.