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Integrated Ferroelectrics
An International Journal
Volume 10, 1995 - Issue 1-4
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Materials processing—PVD

Characterization of Ba0.5Sr0.5TiO3 thin film capacitors produced by pulsed laser deposition

, , , , &
Pages 73-79 | Received 20 Mar 1995, Published online: 19 Aug 2006
 

Abstract

High crystallinity Ba0.5Sr0.5TiO3 thin films were deposited on LaAlO3 substrates by pulsed laser deposition. A conductive metallic oxide, SrRuO3, provided not only a good bottom electrode for Ba0.5Sr0.5TiO3 but also an excellent seed layer for epitaxial growth of Ba0.5Sr0.5TiO3 on it. The epitaxial nature of the Ba0.5Sr0.5TiO3 thin films on the LaAlO3 substrate was confirmed by x-ray diffraction, Rutherford backscattering spectroscopy, and cross-sectional transmission electron microscopy. The quite good dielectric and electrical properties of crystalline Ba0.5Sr0.5TiO3 thin films suggest that Ba0.5Sr0.5TiO3/SrRuO3 is a good combination in terms of structural, electrical, and dielectric properties of Ba0.5Sr0.5TiO3 thin films.

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