Sol-gel PZT thin films on nickel alloy electrodes

Abstract

The Ni alloy electrode was used for a bottom electrode of PZT thin films prepared by sol-gel process. Although PZT films were crystallized on soda–lime glass substrates with the alloy electrodes at a relatively low temperature of 500°C, second phases of Pb₃O₄ and ZrTiO₄ were produced on the electrode in addition to the perovskite PZT phase. In order to prevent the second phases forming, the heat treatment time of the electrode was increased to obtain the thicker Al₂O₃ layer on the alloy electrode. The second phases decreased with increasing the heat treatment time; however, the phases did not disappear. When BaTiO₃ films were inserted between the electrodes and PZT films, the PZT single phase was obtained. The tan δ of the films decreased with decreasing the amount of the second phases, finally it became 3.9%, the film of which possessed a remanent polarization of 20 μC/cm².

Key Words:

• keywords:
• Nickel alloy electrode
• PZT thin film
• sol-gel process
• buffer layer
• tanδ
• glass substrate