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Integrated Ferroelectrics
An International Journal
Volume 14, 1997 - Issue 1-4
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Materials processing - CVD

Preparation of (PB, LA)TIO3 films by metal organic chemical vapor deposition with new lanthanum precursors

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Pages 85-93 | Received 18 Mar 1996, Published online: 19 Aug 2006
 

Abstract

Thin films of (Pb, La)TiO3 were grown with three new trialkylphosphine oxide adducts of lanthanum tris-tetramethylheptanedione with the general formula La(thd)3(RR'R”3PO)n where thd = tetramethylheptanedione, (CH3)3CCOCHCOC(CH3)3; R = R′ = R″ = CH3; R = R′ = CH3, R″ = C4H9; R = R′ = R″ = C4H9. The new precursors were compared with La(thd)3 and were evaluated for volatility, thermal stability, ease of transport and La incorporation into a (Pb, La)TiO3 film.

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