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Abstract
Performance of the self-patterned SBT/SBNT films from photo-sensitive solutions were optimized by adjusting the film composition and the process. Polarization values of the self-patterned SBT/SBNT films were optimized by decreasing the Sr/Ta ratio of the SBT composition from 0.5 to 0.35-0.45 and adjusting NW(Nb+Ta) ratio of SBNT composition between 0.2 and 0.3. Deep UV irradiation during the self-patterning process increases the polarization and coercive field values of the SBT/SBNT films by promoting film densification and grain growth. Both electroding/deposition sequences (Top-down or Bottom-up) by self-patterning method were demonstrated. High endurance of: SBT/SBNT has been kept even using self-patterning. Performance of the various capacitors including micro capacitor down to 2×2μm2 by self-patterning method was also evaluated.
