Publication Cover
Integrated Ferroelectrics
An International Journal
Volume 21, 1998 - Issue 1-4
29
Views
1
CrossRef citations to date
0
Altmetric
Session 2. Drams and Materials

Effects of bottom electrodes on the leakage properties of sputtered BST thin films

, , , , &
Pages 185-195 | Received 04 Mar 1998, Accepted 03 May 1998, Published online: 19 Aug 2006
 

Abstract

Current-voltage characteristics and time-dependent leakage current behavior of (Ba, Sr)TiO3 (BST) thin films deposited by rf magnetron sputtering have been studied in order to identify the effects of bottom electrodes on leakage properties of BST capacitors. RuO2, Pt and Pt/RuO2 hybrid bottom electrodes were prepared by dc magnetron sputtering and thermal MOCVD. From comparison of time-dependent electrical properties of the films deposited on the various bottom electrodes, the material of bottom electrode is responsible for the observed dielectric relaxation phenomenon, regardless of leakage current level and conduction type of the BST capacitors.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.