Pulsed laser deposition of pyroelectric pclt thin films using a ceramic/metal target

Lirong Zheng State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai, 200050, China

Pingxiong Yang State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai, 200050, China

W-Ping Xu State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai, 200050, China

Chenglu Lin State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai, 200050, China

Wenbiao Wu Department of Electrical Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, 560, Japan

Masanori Okuyama Department of Electrical Engineering, Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, 560, Japan

Abstract

In this paper, we report the preparation and characteristics of Ca and La doped PbTiO₃ (PCLT) thin film on Pt/Ti/SiO₂/Si substrate by laser ablating a ceramic/metal target. The deposited film is polycrystalline and exhibits good ferroelectric hysteresis loop, low leakage, and good pyroelectric properties. The pyroelectric coefficient of the film is high as 8.81 × 10^×8 C/cm²K and the effective dielectric constant of the film is about 352. So the figure of merit of the film is high as 0.78 × 10^×10Ccm/J, indicating that PCLT is a promising material for pyroelectric application.

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Pulsed laser deposition of pyroelectric pclt thin films using a ceramic/metal target

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Pulsed laser deposition of pyroelectric pclt thin films using a ceramic/metal target

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