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Integrated Ferroelectrics
An International Journal
Volume 20, 1998 - Issue 1-4
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Contributed papers

Epitaxial growth of aluminum nitride thin films on (111) si by ecr dual ion beam sputtering

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Pages 251-253 | Published online: 27 Sep 2006
 

Abstract

Aluminum nitride (AIN) thin films grown on silicon substrates are very promising materials for GHz-band bulk and surface acoustic wave (SAW) devices with monolithic circuits because of their high acoustic velocity and piezoelectricity, as well as their passivation and insulating properties. Epitaxial growth techniques for AIN films with high crystallinity and a smooth surface are very important for these applications.

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