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Integrated Ferroelectrics
An International Journal
Volume 20, 1998 - Issue 1-4
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Contributed papers

An Ecr-sputtered zno epitaxial film and its characteristics

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Page 267 | Published online: 27 Sep 2006
 

Abstract

The properties of ZnO film deposited by an RF-magentron-mode Electron Cyclotron Resonance (ECR) sputtering system, which has added magnets to the outside of a cylindrical Zn metal target of the RF-mode ECR sputtering system reported previously[1], are investigated. The ZnO film on the glass substrate deposited by this system was capable of driving a 1.3 GHz fundamental Rayleigh SAW for the first time. These films exhibit almost the same effective electromechanical coupling factors Keff as the theoretical Keff values calculated by finite element method (FEM).

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