Abstract
The properties of ZnO film deposited by an RF-magentron-mode Electron Cyclotron Resonance (ECR) sputtering system, which has added magnets to the outside of a cylindrical Zn metal target of the RF-mode ECR sputtering system reported previously[1], are investigated. The ZnO film on the glass substrate deposited by this system was capable of driving a 1.3 GHz fundamental Rayleigh SAW for the first time. These films exhibit almost the same effective electromechanical coupling factors Keff as the theoretical Keff values calculated by finite element method (FEM).