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SECTION VII: APPLICATIONS

Fabrication and Electrooptical Characterisation of an AFLC-MIM Device

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Pages 349-354 | Published online: 04 Oct 2006
 

Abstract

The electrooptical behavior of antiferroelectric tristable cells with active matrices has been evaluated by preparing MIM displays filled with Chisso CS-4001 AFLC material. MIMs were fabricated by a standard 3-mask process. The displays are 2″, 96 × 128 pixel multiplexed test cells. The cell gap is 1.5 μm in all cases; silica spacers were used. A number of alignment layers and variations in surface conditioning were employed. Single face and double face treatments were tested. An analysis of addressing waveforms has been carried out, aiming to obtain reproducible analogue grayscales. The dynamic range, temperature dependence, and spatial homogeneity of the resulting optical response are presented.

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