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Original Articles

Reaction of CW agents simulants on surfaces in the presence of O3, UV AND O3 + UV

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Pages 775-790 | Received 28 Feb 1984, Published online: 15 Dec 2008
 

Abstract

Simulants for the CW agents HD, GB and VX, deposited as thin films on stainless steel surfaces, were exposed to UV (254 and 185 nm), O3 (0–2 wt% in air) and O3 + UV at 0 and 100% relative humidity. The extents of the simulants decomposition were determined. The simulant for HD was found to be most reactive and its half life under easily achievable experimented conditions was estimated at ⋍7 seconds.

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