![Sample our Engineering & Technology journals, sign in here to start your access, latest two full volumes FREE to you for 14 days]({"type":"image" , "src" : "/sda/5933/TOC-Subject-Sample-2021-Engineering-Tech.jpg"})
A microscopic model based on charge-induced breaking of weak Si-Si bonds is proposed as an explanation for the experimentally observed increase of the dangling-bond density in a-Si: H upon illumination, charge injection, and doping. Energetic aspects of the conversion between weak and dangling bonds and implications for the electronic density of states of a-Si: H are described, and the relation of the model to negative4 defects in this material is discussed.
Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?
To request a reprint or corporate permissions for this article, please click on the relevant link below:
Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?
Obtain permissions instantly via Rightslink by clicking on the button below:
If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.
