Structural analysis of TiN_x films prepared by reactive-ion-beam-enhanced deposition

Abstract

TiN_x films have been prepared using reactive-ion-beam-assisted deposition, a hybrid technique employing evaporation and ion implantation in sequential steps. TiN_x films with the calculated N/Ti ratios varying from 0·32 to 1·5 were prepared on type 304 stainless steel substrates. Microhardness, X-ray diffraction and scanning electron microscopy measurements were carried out on these specimens. X-ray profile analysis was carried out to obtain crystallite sizes and residual stresses present in the specimens. The orientation factor was calculated to determine the texture of the film. Abrupt changes in the strain, size and orientation parameters were observed for the near-stoichiometric films. In general the films were defect-rich and of fine grain size. The films having a low concentration of N were oriented in the [111] direction. The microhardness was found to be higher than the bulk value and a maximum for the near-stoichiometric composition.