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Original Articles

Azide photoresist for thermal-laser imaging

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Pages 133-140 | Received 15 Jun 1999, Accepted 09 Jul 1999, Published online: 08 Jul 2016
 

Abstract

Two azide-type compounds for thermal-laser photoresists have been investigated. One was an azide-pendant polyvinyl ether) as a binder polymer for positive imaging, and the other was a cyanine dye azide for negative imaging. The positive photoresist, which was composed of nigrosine as an infrared (IR)-absorbing dye and an azide-pendant polyvinyl ether), and the negative photoresist, which was composed of a Novolak resin and a cyanine dye azide as an IR-absorbing dye, were exposed by scanning a light spot of 15 mm from a 780 nm, 30 mW laser, giving sensitivities of 340 and 500 mJ/cm2 for the positive and the negative photoresist.

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