Sensitization mechanisms of a multi-substituted isoindolomethene in a photopolymer coating layer: the effect on the sensitization mechanisms incorporating the bicyclo[2,2,2]octene group into bipyrromethene

T UranoResearch Centre, Mitsubishi Kagaku Corporation, Yokohama, Japan;Centre for Cooperative Research, Chiba University, Chiba, Japan

E Ohno-OkumuraResearch Institute of Chemical Science, Technology and Education, Chiba-ken, Japan

K SakamotoDepartment of Industrial Chemistry, College of Industrial Technology, Nihon University, Chiba-ken, Japan

M WadaDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

S ItoDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

N OnoDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

S SuzukiDepartment of Chemistry, Faculty of Science, Ehime-ken, Japan

T YamaokaDepartment of Information and Image Science, Faculty of Engineering, Chiba University, Chiba, Japan

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Abstract

The sensitization mechanisms for photoinitiations consisting of a 1,7,13-trimethyl-2,5,9,12-tetrahydro-2,5;9,12-diethano-isoindolomethene difluoroborate and a 2,8-diethyl- 1,3,5,7,9-pentamethylbipyrromethene difluoroborate, together with a radical generating reagent 3,3′,4,4′-tetrakis(terr-butyldioxycarbonyl)benzophenone, in a poly (methyl methacrylate) film have been investigated by laser flash photolysis using a total reflection cell. The effect on the sensitization mechanisms of incorporating the bicyclo group into bipyrromethene dye was discussed.

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Sensitization mechanisms of a multi-substituted isoindolomethene in a photopolymer coating layer: the effect on the sensitization mechanisms incorporating the bicyclo[2,2,2]octene group into bipyrromethene

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Sensitization mechanisms of a multi-substituted isoindolomethene in a photopolymer coating layer: the effect on the sensitization mechanisms incorporating the bicyclo[2,2,2]octene group into bipyrromethene

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