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Bio-inspired and biomedical materials

Dual-acting antibacterial porous chitosan film embedded with a photosensitizer

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Pages 562-572 | Received 08 May 2020, Accepted 09 Jul 2020, Published online: 03 Aug 2020
 

ABSTRACT

This study proposes to develop a dual-acting antibacterial film of porous chitosan (Cs) embedded with small molecular compound, which possesses photosensitive characteristics with bactericidal efficacy, to promote the accelerated recovery of infectious wounds. The Cs/small molecular compound (Cs-cpd.2) dressing was prepared using the freeze-drying method. Characterization of the synthesized Cs-cpd.2 indicated that it has high porosity and moisture absorption effect, hence enhancing the absorption of wound exudate. Experimental results showed that Cs-cpd.2 dressing has good bactericidal and bacteriostatic effects on Staphylococcus aureus under visible-light irradiation and has antibacterial effect in the dark. It was also found that the small molecular compound does not have cytotoxicity at a dose of 0–5 μM. Furthermore, Cs-cpd.2 that contained small molecular compound with a concentration of 0.3–1 μM has positive effect on both the cell viability rate and cell proliferation rate of human fibroblast CG1639. Cs-cpd.2 can significantly promote cell proliferation when the small molecular compound and the basic fibroblast growth factor bFGF were added together. Therefore, the proposed Cs-cpd.2 dressing is feasible for photodynamic therapy (PDT) and clinical wound dressing applications.

GRAPHICAL ABSTRACT

Acknowledgments

The authors are grateful to the Show Chwan Memorial Hospital, Taiwan and the Ministry of Science and Technology of Taiwan (MOST- 108-2221-E-005-067) for their financial support of this research.

Supplementary material

Supplemental data for this article can be accessed here.

Disclosure statement

No potential conflict of interest was reported by the authors.

Additional information

Funding

This work was supported by the Show Chwan Memorial Hospital [2020-NCHU]; Ministry of Science and Technology of Taiwan [MOST- 108-2221-E-005-067].