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Original Articles

Self-diffusion of silicon in molybdenum disilicide

, , , , , , , & show all
Pages 737-756 | Received 22 Sep 2003, Accepted 27 Oct 2003, Published online: 02 Sep 2006
 

Abstract

The self-diffusion of silicon in single crystal MoSi2 was studied by means of a radiotracer technique using the short-lived radioisotope 31Si (half-life ), which was produced and implanted into the samples at the ion-guide isotope separator on-line device at the University of Jyväskylä in Finland. Diffusion annealing and subsequent serial sectioning of the specimens were performed immediately after the radiotracer implantation. In the entire temperature region investigated (835–1124 K), the 31Si diffusivities in both principal directions of the tetragonal MoSi2 crystals obey Arrhenius laws, where the diffusion perpendicular to the tetragonal axis is faster than parallel to it. In previous studies the same features were observed for the 71Ge diffusivities in MoSi2, except that these are somewhat higher than those of 31Si. Furthermore, it is noteworthy that in MoSi2 the diffusivities of 31Si and 71Ge are orders of magnitude faster than the diffusivity of 99Mo. This large difference suggests that silicon diffusion and molybdenum diffusion are completely decoupled and that silicon diffusion takes place exclusively on the silicon sublattice. Literature data on the phase growth of MoSi2 are in accordance with the present results on the 31Si diffusivities; Monte Carlo simulations of the correlation effects of vacancy-mediated diffusion on the silicon sublattice of MoSi2 lead to their rationalization.

Acknowledgements

We are grateful to Dr K. Ito and Professor M. Yamaguchi from Kyoto University, Japan, for the production of the MoSi2 single crystals, to M. Hennemann from Stuttgart University, Germany, and J. Huikari and A. Nieminen from the University of Jyväskylä, Finland, for their assistance in the radiotracer experiments, to Dr W. Sprengel from Stuttgart University, Germany, for making available positron annihilation data on vacancies in MoSi2 prior to publication, and to Professor F. J. J. van Loo from the University of Eindhoven, The Netherlands, for helpful comments on the relation between phase growth and tracer diffusivities. Financial support by the Deutsche Forschungsgemeinschaft (research project Me 480/41-1) is gratefully acknowledged.

Notes

¶ Present address: University of Helsinki, Accelerator Laboratory, PO Box 43, FIN-00014 Helsinki, Finland.

† For example, at 1400 K, and ; thus, according to equation (Equation21), .

‡ For molybdenum, Mo5/8Si3/8, Mo1/3Si2/3 and silicon the molar volumes are 0.94, 0.85, 0.81 and 1.21 × 10−5 m3 respectively.

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