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Original Articles

On the structure and composition of nanoscale TiAlN/VN multilayers

, , , , &
Pages 967-978 | Received 17 Sep 2004, Accepted 07 Apr 2005, Published online: 11 Jan 2007
 

Abstract

The chemical and physical structure of a TiAlN/VN multilayer, of average layer thickness 3.4 ± 0.4 nm, was characterized using a spherical aberration-corrected STEM, utilizing a nominal 0.1-nm beam, by HAADF and EELS. The interface between layers was shown to be rough, with local thickness variations evident in layer thickness. Chemical mixing between layers was identified, consistent with numerical modelling of the deposition flux and layer growth. The implications of the compositional modulation are discussed.

Acknowledgement

Financial support from Engineering and Physical Science Research Council (EPSRC), UK, Grant No. GR/N23998/01 is acknowledged.

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