![Sample our Physical Sciences journals, sign in here to start your FREE access for 14 days]({"type":"image" , "src" : "/sda/110819/TOC-Subject-Sample-2021-Physical-Sciences.jpg"})
ABSTRACT
The effect of substrate temperatures on the structure of self-assembled monolayers (SAs) of organosilane (CH3)(CH2)17Si(OC2H5)3 on SiO2 substrates were investigated by X-ray reflectometry and water contact angle measurements. (CH3)(CH2)17Si(OC2H5)3 SAMs were fabricated by a chemical vapor deposition process for two hours, and the substrate temperature was varied between 80 and 170°C. The angular dependence of the specular X-ray reflectivity was measured, and thickness, density, surface roughness and interface roughness of SAMs were determined by fitting the observed curves to model calculations. It was clarified that the thickness, density and water contact angles of SAMs increased lineally with increasing temperature, and saturated at temperatures higher than 140°C.