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Plasma Display Materials and Devices

Atomic Layer Deposition of Aluminum Oxide Thin Film on BaMgAl10O17:Eu2+ Phosphor

, , , , , , , & show all
Pages 239/[519]-245/[525] | Published online: 31 Jan 2007
 

Abstract

An investigation is reported by the coating of BaMgAl10O17:Eu2+ phosphor by aluminum oxide using atomic layer deposition. Aluminum oxide films were prepared the chamber temperature of 350°C using Al(CH3)3 and H2O as precursors and reactant gas, respectively. EDX and FTIR analysis showed the surface composition of coated phosphor was aluminum oxide. The photoluminescence intensity of coated phosphors showed 10.3 ∼ 36% higher than that of uncoated. This means that the reactive surface is uniformly coated with stable aluminum oxide to reduce the dead surface layer without change of bulk properties.

Acknowledgments

The study has been supported partially by Kumoh National Institute of Technology.

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