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Abstract
The faster coating speed is required to the photoresist for slit coating process. When the photoresist is coated at high coating speed, the film thickness uniformity becomes worse. The carboxylic acids and the ester compounds with long alkyl chain were added into photoresist for the slit coating process. Such photoresist showed really good film thickness uniformity of photoresist film on the glass substrate at high coating speed condition.
Acknowledgments
We received many useful advices for this study from Dr. Kurihara. Some of the authors appreciate his kind support for us.
We made use of AFM at Hamamatsu Industrial Research Institute of Shizuoka Prefecture. Authors appreciate the cooperation by Mr. Shinya Takoh.