MOCVD-Fabricated TiO₂ Thin Films: Influence of Growth Conditions on Fibroblast Cells Culture

Abstract

TiO₂ thin films with various morphologies were grown on Ti substrates by the LP-MOCVD technique (Low Pressure Chemical Vapour Deposition from Metal-Organic precursor), with titanium tetra-iso-propoxide as a precursor. All the films were prepared in the same conditions except the deposition time. They were characterized by X-ray diffraction, scanning electron microscopy, optical interferometry, water contact angle measurements. MOCVD-fabricated TiO₂ thin films are known to be adapted to cell culture for implant requirements. Human gingival fibroblasts were cultured on the various TiO₂ deposits. Differences in cell viability (MTT tests) and cell spreading (qualitative assessment) were observed and related to film roughness, wettability and allotropic composition.

Keywords:

• biocompatibility
• fibroblasts
• MOCVD
• titanium
• titanium oxide

Acknowledgments

We thank to European Commission for supporting this Transfer of Knowledge (No 014059) in the frame of Marie Curie actions. We thank also Yannick Thébault for assistance in scanning electron microscopy.

Notes

*A(a) = majority (minority) of anatase; R(r) = majority (minority) of rutile.

**Qualitative assessment.