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Abstract
The results of deep lithography based on the long-wavelength UV photopolymerization with a light self-focusing effect are presented. The effect of the formation of “bridges” between the nearest photopolymerization areas is revealed. Its sources such as the inhibition of photopolymerization by oxygen due to its diffusion to the exposed area are discussed. The conditions for a high aspect ratio of microelements (up to 100) are determined.
Acknowledgments
The work was made under the support of grant RNP.2.1.1.1403 of the Russian Ministry of Education by the project “Investigation of processes of microoptic surface formation in light field at UV-curing of monomer compositions” 2006–2007.