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Abstract
X-ray lithography has been used widely for the fabrication of nano/micro structures. This process was applied to the fabrication of barrier ribs with a high aspect ratio for plasma display panel (PDP). The design of X-ray mask and X-ray exposure process were optimized to fabricate highly precise barrier rib pattern for PDP.
Acknowledgments
This research was supported by the Advanced Display Manufacturing Research Center (ADMRC), Regional Innovation Center Program of the Ministry of Knowledge Economy, Republic of Korea. And the research at PLS has been supported by the Ministry of Science and Technology, Korea.