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THIN SOLID FILM

Screen-Printed Cu Source/Drain Electrodes for a-InGaZnO Thin-Film Transistors

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Pages 161-167 | Published online: 08 Jan 2014
 

Abstract

We report screen-printed copper source/drain electrodes for a-InGaZnO (a-IGZO) thin-film transistors (TFTs). The best electrical characteristics of the a-IGZO TFTs were a field-effect mobility of 2.06 cm2/Vs, a threshold voltage of 3.40 V, an on/off current ratio of 6.0 × 103A/A, and a subthreshold swing of 7.02 V/decade. Resulting TFT performances indicate that blocking the inter-diffusion of Cu and impurities is a key factor to fabricate low leakage current and high performance a-IGZO TFTs with printed Cu S/D electrodes.

Acknowledgment

This work was supported by the Industrial strategic technology development program (10041041, Development of non-vacuum and non-lithography based 5 width Cu interconnect technology for TFT backplane) funded by the Ministry of Knowledge Economy (MKE, Korea).

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