Nano‐crystalline ZnS films were deposited onto glass substrates by close‐spaced evaporation with different deposition rates in the range, 10–60 Å/sec at a substrate temperature of 300°C. The as‐grown layers were characterized with X‐ray diffractometer (XRD), atomic force microscope (AFM), energy dispersive analysis of X‐rays (EDAX) and fluorescence spectrophotometer. The studies showed that the optimum rate of deposition for the growth of near stoichiometric ZnS layers was 20 Å/sec. The films exhibited cubic structure in the entire range of deposition rates. The AFM data revealed that the films had nanosized grains with a grain size of ∼40 nm. The effect of rate of deposition onto photoluminescence behaviour was also studied.
Physical Behaviour of Nanocrystalline ZnS Layers Grown by Close‐Spaced Evaporation
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