X‐ray Scattering from Films of Semiconducting Polymers

A review of recent studies of X‐ray scattering from films of semiconducting polymers is presented with an emphasis on materials used for thin film transistors. Common types of scattering experiments are described with a focus on synchrotron X‐ray sources. The basic molecular packing structure and microstructural features of polycrystalline thin films of polythiophenes and polyfluorenes are described. The influence of processing conditions, such as thermal annealing, on the microstructure of these materials is outlined and example studies on polythiophenes are presented in detail. The microstructures of blends of these polymers and their co‐polymers are also discussed

Keywords:

• semiconducting polymers
• X‐ray scattering
• thin films

Acknowledgements

Portions of this research were carried out at the Stanford Synchrotron Radiation Laboratory (SSRL), a national user facility operated by Stanford University on behalf of the U.S. Department of Energy, Office of Basic Energy Sciences. The author thanks M. F. Toney (SSRL), A. Salleo (Stanford), R. J. Kline (NIST), and J. E. Northrup (PARC) for helpful discussions.

Notes

^[1]When measuring such peaks, it is important to correct for the background reflectivity of the sample, but for highly crystalline polymers this signal is weak compared to that from the polymer film itself.