Radical Additions of Bis(trimethylsilyl)phosphite to Vinyltimethylsilane and Vinyltriethoxysilane: Crystal Structure of 2-Trimethylsilylethane-phosphonic Acid

Abstract

Organosilicon-phosphonate compounds with the general formula (R) n (RO) 3 m n Si(CH 2 ) m P(O)(OSiR' 3 ) 2 are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis(trimethylsilyl)phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate compounds. 2-Trimethylsilylethanephosphonic acid was prepared from its bis(trimethylsilyl) ester by alcoholysis. The crystal structure of the acid consists of two-dimensional arrays built up from the (P--)O--H·;·;·;O--P hydrogen bonds.

Keywords:

• Crystal Structure
• Hydrogen Bonding
• Supramolecular Array
• Surface Treatment