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ABSTRACT
The stability of a colloidal suspension is dependent upon many factors. Often the presence of larger than normal particles in a given suspension is indicative of the commencement of destabilization. Single Particle Optical Sensing (SPOS) has been proven to be a highly accurate and reproducible particle characterization technique. By measuring each and every particle within a sample, SPOS precisely reports incidences of coarse particles found in the tail of the particle size distribution. To complement particle size distributions reported by SPOS, the stability of a sample can also be classified using a separation analyzer. This separation analysis is based on a microprocessor controlled analytical centrifuge that directly measures the stability and de-mixing rates of emulsions and concentrated suspensions. Theory and experimental results from the two methods for samples of emulsions, coatings, and CMP (chemical mechanical polishing) slurries are presented and discussed.