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Original Articles

Growth and Characterization of β‐HgS Thin Films by Annealing Hg2+‐Dithiol Self‐Assembled Multilayers

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Pages 641-644 | Received 16 Jan 2005, Published online: 06 Feb 2007
 

Abstract

Hg2+‐dithiol self‐assembled multilayers were constructed by alternatively depositing mercury ion and 1, 6‐hexanedithiol. Cubic β‐HgS thin films were obtained by annealing the self‐assembled Hg2+‐dithiol multilayers at 503 K for 2 h. The grain size was estimated to be 16 nm by use of the Scherrer formula from the XRD pattern. The HgS thin films showed a blue shift in band gap energy due to small grain size. The sheet resistance of the film was sensitive to UV light and the dark resistance was 4.84×104 Ω/2.

Acknowledgments

This work was financially supported by Excellent Young Teacher Program and Research Foundation of Returned Student Abroad, MOE of China. We thank the Shanghai Education Committee for support.

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