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Abstract
The polyimides are known for their practical usage as passivation or insulation in the microelectronics industry. They have excellent properties such as chemical and mechanical resistance, good insulation and planarizability. Photosensitive polyimides have significantly enhances the development in microelectronics devices, since they offer the simplification of polyimide layer pattern generation by eliminating the need for a photoresist. The present review comprises the examples as model as more tractable, soluble in organic solvent and easily processable polyimides without the loss of thermal stability. Present review article deals with the synthesis, characterization and applications of photosensitive polyimides which has been cited in the literature for the past two decades.
ACKNOWLEDGMENT
Authors are thankful to the Executive Director of C-MET for granting the permission to publish this review article.
