181
Views
9
CrossRef citations to date
0
Altmetric
Focused Reviews

X‐ray Photoelectron Spectroscopy Studies on the Surface Segregation in Poly(dimethylsiloxane) Containing Block Copolymers

&
Pages 1-18 | Received 20 May 2004, Accepted 26 Sep 2004, Published online: 02 Dec 2011
 

Abstract

The surface science of polymer materials is a dynamic field, largely because of application in such areas as composite materials, wetting, coatings, adhesion, friction, and biocompatibility. In this review, we have focused on the study of surface segregation in poly(dimethylsiloxane) (PDMS) containing block copolymers using X‐ray photoelectron spectroscopy (XPS), accomplished in our laboratory for this recent decade. We will give insight on XPS which is an effective quantitative tool to probe an air‐polymer interface of a few tens of nanometers thick for investigating surface segregation in common multiphase polymer systems as well as in PDMS containing block copolymers.

Acknowledgments

The work was supported by the National Science Foundation Grants (NSF CHE 9704996, NSF CHE‐0079114, NSF CHE‐0316735). CSHa wishes to thank the Research Foundation, The State University of New York, U.S.A., Pusan National University Overseas Grant, and the National Research Laboratory Program, MOST, Korea.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.