Abstract
In the presence of wet SiO2, HIO3 is highly efficient for the selective oxidation of sulfides to sulfoxides. It may be applied to any type of dialkyl and alkyl aryl sulfides. It develops under solvent‐free conditions, and gives high yield in the presence of different functional groups on the sulfide at room temperature.
Acknowledgment
We greatly acknowledge the research councils of Mazandran University for their financial support.