Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering

Ali Fatih Yetim Ataturk University, Engineering Faculty, Metallurgical Engineering Department, 25240-Erzurum, Turkey;, Email: [email protected]

Ihsan Efeoglu Ataturk University, Engineering Faculty, Mechanical Engineering Department, 25240-Erzurum, Turkey

Ayhan Celik Ataturk University, Engineering Faculty, Mechanical Engineering Department, 25240-Erzurum, Turkey

Akgün Alsaran Ataturk University, Engineering Faculty, Mechanical Engineering Department, 25240-Erzurum, Turkey

Irfan Kaymaz Ataturk University, Engineering Faculty, Mechanical Engineering Department, 25240-Erzurum, Turkey

Abstract

Composite structured solid thin films were deposited on 52100 tool steel by co-sputtering from BN, TiB₂, MoS₂ and Ti targets using a closed-field unbalanced magnetron sputtering process (CFUBMS). The structural and mechanical properties of the composite structured coatings were investigated. The composition and morphology of the films were investigated using X-ray diffraction and scanning electron microscopy (SEM). The adhesion properties of the films were characterized by the use of a Revetest-scratch tester. The adhesion test results indicated that bias voltage was the most effective coating parameter related to the critical load.

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Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering

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Deposition and Adhesion Characterization of Ti(BN:MoS2) Based Composite Thin Films Prepared by Closed-Field Unbalanced Magnetron Sputtering

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