A Far Field Pattern Analysis Technique for Reflectarrays Including Mutual Coupling Between Elements

Abstract

A technique is developed for the far field pattern analysis of reflectarrays, which is called 'element-in-array pattern' analysis technique. The technique rigorously takes the effects of mutual coupling between elements and the surrounding array environment into account by extracting the scattered fields of the element aperture in a realistic array configuration. Numerical results validate its accuracy and effectiveness.