Measurements of Microwave Dielectric Properties of (1-x)TiO2-xCaTiO3 and (1-x)TiO2-xSrTiO3 thin Films By The Cavity Perturbation Method

Abstract

This research studies the measurements of dielectric properties of thin films at microwave frequencies by the cavity perturbation method. The measured frequency is in X-band (8.2–12.4 GHz). The titanium dioxide based (1-x)TiO₂-xCaTiO₃ and (1-x)TiO₂-xSrTiO₃ thin films deposited by the RF reactive magnetron sputtering method are adopted for the measurements. It was found that the dielectric constants of the films are increased as the compositions of CaTiO₃ or SrTiO₃ are increased. The microwave dielectric constants and loss tangents of films are measured. The accuracy of measurements is discussed.