Influence of copper on hardness of amorphous As–Se–I thin films

Abstract

The paper reports on hardness of thin amorphous films of the Cu_x(As_38·5Se₅₄I_7·5)_100–x type for x = 10, 15, 20 and 25 at-% evaluated by microindentation measurements and instrumented nanoindentation testing. Values of determined microhardness are in the interval of 748–1137 MPa, while nanohardness are in the interval of 930–1591 MPa and can be regarded as moderate in the category of chalcogenide glasses. Isotropic mechanical properties on thin films surface are determined. Influence of copper on mechanical properties of As–Se–I films is discussed in terms of possible structural units in glass matrix.

Keywords:

• Hardness
• Amorphous chalcogenides
• Thin films

This work is supported by the project nos. OI171022 and III45020 of the Ministry of Education, Science and Technological Development of the Republic of Serbia.