Publication Cover
Advances in Applied Ceramics
Structural, Functional and Bioceramics
Volume 110, 2011 - Issue 1
75
Views
4
CrossRef citations to date
0
Altmetric
Original Article

Chemical bonding structures of silicon oxynitride films grown by ionised N2 and pure O2 gas mixtures at low temperature

, , , , , & show all
Pages 25-29 | Received 02 Feb 2010, Accepted 12 May 2010, Published online: 22 Nov 2013
 

Abstract

Abstract

The ultrathin silicon oxynitride (SiOxNy) films were formed using the direct oxynitridation of Si using ionised N2 and pure O2 gas mixtures at the relatively low temperature (600°C). The in situ X‐ray photoelectron spectroscopy (XPS) was used to assess the chemical composition and chemical state of the SiOxNy films. N 1s XPS spectra reveals that at least three characteristic N bonding states such as N≡Si3, N–(SiOx)3 and N = Si2–O bonds are formed in the SiOxNy films. As growth time increases, the N–(SiOx)3 bond is dominant in SiOxNy films, although N≡Si3 bonds are mainly formed in the initial growth stage at the temperature of 600°C. As considering the absence of direct bonding between N and O atoms, the nitridation and oxidation processes are believed to proceed independently. The increase in the growth temperature leads to the breakdown of both N–(SiOx)3 and N≡ = Si3 bonds and transformation into N = Si2–O bonding structure.

This work was in part supported by the Industrial Source Technology Development Programs (no. 2009‐F014‐01) of the Ministry of Knowledge Economy of Korea and by World Class University Program (no. R31‐20009) from KMEST of Korea. H.‐J. Yun and J. Lee also acknowledge the support from the National Research Foundation of Korea funded by the Ministry of Education, Science and Technology (no. 2009‐0081966).

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.