Ion–surface interactions: from sputtering to reactive ion etching

Abstract

An overview of ion–surface interactions is presented, pertaining to their importance in modern thin film processing. The fundamentals of the physics of energetic ion–surface collisions are reviewed briefly, with particular emphasis on low energy ions (i.e. ion energies below 1 keV). Recent examples of ion assisted processes are discussed from the areas of sputtering, ion beam etching, and reactive ion etching. These examples demonstrate that by using low energy ions, advantage can often be taken of the beneficial effects of ion–surface bombardment in controlling film removal while minimising the adverse effects of ion induced damage to the film.

MST/1690