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Transactions of the IMF
The International Journal of Surface Engineering and Coatings
Volume 65, 1987 - Issue 1
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Original Articles

Estimation of electroless metal deposition rate from measured bath potential

A. OniDepartment of Metallurgical Engineering, Federal University of Technology, Akure, Nigeria.
,
R. CottisCorrosion Centre, University of Manchester, Institute of Science and Technology, Manchester.
&
G. E. ThompsonCorrosion Centre, University of Manchester, Institute of Science and Technology, Manchester.
Pages 105-107 | Published online: 08 May 2017

Citations (4)

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Read on this site (2)

P. Cavallotti, L. Nobili, D. Colombo & F. Krüger. (1990) Control of Ni-P and Co-P Chemical Deposition with Transient Voltage Curves and Structure of the Deposits. Transactions of the IMF 68:2, pages 55-58.
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A. Oni. (1988) The mode of action of thiourea in electroless nickel plating. Transactions of the IMF 66:1, pages 47-49.
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Articles from other publishers (2)

Jef R. Roos, Jean‐Pierre Celis & Marc De Bonte. 2006. Materials Science and Technology. Materials Science and Technology.
J.K. Dennis & T.E. Such. 1993. Nickel and Chromium Plating. Nickel and Chromium Plating 310 329 .

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