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The Journal of Photographic Science Volume 12, 1964 - Issue 4
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Original Articles

The Third Fishenden Memorial Lecture: The Photo-Resist Story—From NiéPce to the Modern Polymer ChemistFootnote

M. Hepher (Fellow)Research Laboratory, Kodak Limited, Wealdstone. Harrow, Middlesex
Pages 181-190 | Received 22 May 1964, Published online: 23 Jul 2016

Citations (16)

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B. Woods. (1968) Printed Circuit Resists—A Review. Transactions of the IMF 46:1, pages 131-136.
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Articles from other publishers (15)

Shigetaka Nakamura & Kenzo Fujimoto. (2014) Rapid Photopolymerization of Oligodeoxynucleotides by 3-Cyanovinylcarbazole mediated DNA Photocrosslinking. Journal of Photopolymer Science and Technology 27:4, pages 485-490.
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Hartmut Steppan, Donald C. Mammato, Thomas Stoudt & Michael C. P. Watts. 2003. Ullmann's Encyclopedia of Industrial Chemistry. Ullmann's Encyclopedia of Industrial Chemistry.
Tetsuya Osaka & Masahiro Yoshino. 2010. Modern Electroplating. Modern Electroplating 369 382 .
Yang Jiao, Jinbao Guo, Xiaoming Dong, Rui Li & Jie Wei. (2010) Kinetic analysis of solid‐state photodimerization reaction of photosensitive monomers and a polymer with cinnamoyl moieties. Journal of Applied Polymer Science 116:6, pages 3569-3580.
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David H. Jones & Jenny M. Jones. (2006) Negative-Working Lithographic Diazo Resins:  The Structure of 4-Diazodiphenylamines (Diazo S and Diazo MS) and Their Polymeric Formaldehyde Condensates. Industrial & Engineering Chemistry Research 45:14, pages 4884-4891.
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Detlef Winkelmann, Manfred Lutz, Damodar M. Pai, Andrew R. Melnyk, Richard Hann, Walter Crooks, Keith S. Pennington, Francis C. Lee, C. Wayne Jaeger, Don R. Titterington, Walter Lutz, Arno Bräuninger, Luc De Brabandere, Frans Claes, Rene De Keyzer, Wilhelmus Janssens, Johan Verelst, Werner Frass, Thomas Telser, Horst Hoffmann, Bernd Bronstert, Karl-August Springstein, Hartmut Steppan, Donald C. Mammato, Thomas Stoudt, Michael C. P. Watts & David Allen. 2000. Ullmann's Encyclopedia of Industrial Chemistry. Ullmann's Encyclopedia of Industrial Chemistry.
Imane Assaı̈d, Isabelle Hardy & Dominique Bosc. (2002) Controlled refractive index of photosensitive polymer: towards photo-induced waveguide for near infrared wavelengths. Optics Communications 214:1-6, pages 171-175.
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J. L. Chaloupka, Y. Fisher, T. J. Kessler & D. D. Meyerhofer. (1997) Single-beam, ponderomotive-optical trap for free electrons and neutral atoms. Optics Letters 22:13, pages 1021.
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S. Richard Turner & Robert C. Daly. 1989. Comprehensive Polymer Science and Supplements. Comprehensive Polymer Science and Supplements 193 225 .
S. Richard Turner & Robert C. Daly. 1989. Photopolymerisation and Photoimaging Science and Technology. Photopolymerisation and Photoimaging Science and Technology 75 113 .
J. H. Altman. (1972) Microphotography and the Kodak Research Laboratories. Applied Optics 11:1, pages 22.
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Erich Roßhaupter & Dieter Hundt. (2004) Photolacke. Chemie in unserer Zeit 5:5, pages 147-153.
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Jack J. Bulloff. (2004) Prospective photosensitization of photopolymerization systems. Polymer Engineering & Science 11:5, pages 405-415.
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Gentaro NAGAMATSU. (1971) Application of Photosensitive Polymers for Lithographic Printing Plate. Journal of the Japan Society of Colour Material 44:3, pages 129-137.
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Yoshitada TOMODA. (1971) Photosensitive Polymers in Photographic Imaging. Journal of the Japan Society of Colour Material 44:3, pages 116-123.
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