Nicholas R. White. 2023. Ion Beam Technology and Applications. Ion Beam Technology and Applications.
Andrew Wittkower & Geoffrey Ryding. (2018) Peter H. Rose - Father of Ion Implantation: The Early Years. Peter H. Rose - Father of Ion Implantation: The Early Years.
Isao Yamada. 2015. Materials Processing by Cluster Ion Beams. Materials Processing by Cluster Ion Beams
1
20
.
L.S. Wielunski, G.D. Paterson, J.M. Bell & R.E. Clegg. (2004) Production of Si+ and Cl+ ion beams from a Freeman type ion source using low toxicity and non-corrosive vapours as source gas. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 215:1-2, pages 262-267.
Crossref
K. Miyake. 2002. Purification Process and Characterization of Ultra High Purity Metals. Purification Process and Characterization of Ultra High Purity Metals
203
222
.
R.B. Fair. (2011) A Historical View of the Role of Ion-Implantation Defects in PN Junction Formation for Devices. MRS Proceedings 610.
Crossref
M.I. Current. (2000) Plasma immersion implantation for modification and doping of semiconductor materials: a historical perspective: 1886 to 2000. Plasma immersion implantation for modification and doping of semiconductor materials: a historical perspective: 1886 to 2000.
C.M. McKenna. (2000) A personal historical perspective of ion implantation equipment for semiconductor applications. A personal historical perspective of ion implantation equipment for semiconductor applications.
P.H. Rose. (1998) A history-mainly about ion implantation equipment since 1984. A history-mainly about ion implantation equipment since 1984.
R.B. Fair. (1998) History of some early developments in ion-implantation technology leading to silicon transistor manufacturing. Proceedings of the IEEE 86:1, pages 111-137.
Crossref
Heiner Ryssel. 1997. Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physicochemical Characterization. Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physicochemical Characterization
1
29
.
Seiji Ogata, Takeshi Hisamune & Seiji Seki. (1995) Emittance measurement of mass-separated high-current ion beams. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 363:1-2, pages 468-472.
Crossref
S. Moffatt. (1995) Ion implantation from the past and into the future. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 96:1-2, pages 1-6.
Crossref
J H Freeman. 1994. Laser and Ion Beam Modification of Materials. Laser and Ion Beam Modification of Materials
31
40
.
Michael I. Current. (2011) A View of the Commercial Application of Ion Implantation for Silicon VLSI Manufacturing. MRS Proceedings 316.
Crossref
J.H. Freeman. 1993. Ion Implantation Technology–92. Ion Implantation Technology–92
357
364
.
T.E. Seidel & L.A. Larson. (2013) Status of Low-Dose Implantation for VLSI. MRS Bulletin 17:6, pages 34-39.
Crossref
D Aitken. (1989) The development of ion implanter technology. Vacuum 39:11-12, pages 1025-1029.
Crossref
Alberto Gras-Marti & Uffe Littmark. 1988. Materials Modification by High-fluence Ion Beams. Materials Modification by High-fluence Ion Beams
257
284
.