30
Views
8
CrossRef citations to date
0
Altmetric
Original Articles

Interface defect structure of metal-organic chemically vapour-deposited InP and GaAs on Si(111)

, , &
Pages 1145-1159 | Received 09 May 1994, Accepted 21 Oct 1994, Published online: 13 Sep 2006

Keep up to date with the latest research on this topic with citation updates for this article.

Read on this site (1)

Viktor S. Kopp & Vladimir M. Kaganer. (2014) X-ray diffraction from hexagonal dislocation networks. Philosophical Magazine 94:28, pages 3247-3258.
Read now

Articles from other publishers (7)

Oliver Supplie, Oleksandr Romanyuk, Christian Koppka, Matthias Steidl, Andreas Nägelein, Agnieszka Paszuk, Lars Winterfeld, Anja Dobrich, Peter Kleinschmidt, Erich Runge & Thomas Hannappel. (2018) Metalorganic vapor phase epitaxy of III–V-on-silicon: Experiment and theory. Progress in Crystal Growth and Characterization of Materials 64:4, pages 103-132.
Crossref
W. Guo, L. Date, V. Pena, X. Bao, C. Merckling, N. Waldron, N. Collaert, M. Caymax, E. Sanchez, E. Vancoille, K. Barla, A. Thean, P. Eyben & W. Vandervorst. (2014) Selective metal-organic chemical vapor deposition growth of high quality GaAs on Si(001). Applied Physics Letters 105:6.
Crossref
H A Fonseka, H H Tan, J Wong-Leung, J H Kang, P Parkinson & C Jagadish. (2013) High vertical yield InP nanowire growth on Si(111) using a thin buffer layer. Nanotechnology 24:46, pages 465602.
Crossref
Andre Proessdorf, Frank Grosse, Oleksandr Romanyuk, Wolfgang Braun, Bernd Jenichen, Achim Trampert & Henning Riechert. (2011) Interface engineering for improved growth of GaSb on Si(111). Journal of Crystal Growth 323:1, pages 401-404.
Crossref
William M. Vetter & Michael Dudley. (2004) Characterization of defects in 3C-silicon carbide crystals. Journal of Crystal Growth 260:1-2, pages 201-208.
Crossref
David J Smith. (1997) The realization of atomic resolution with the electron microscope. Reports on Progress in Physics 60:12, pages 1513-1580.
Crossref
F. Ernst. (1997) Interface dislocations forming during epitaxial growth of GeSi on (111) Si substrates at high temperatures. Materials Science and Engineering: A 233:1-2, pages 126-138.
Crossref

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.